The main bottlenecks of current 3D printing technology were its relatively slow operating speed and poor resolution.
When higher-level solutions were needed, 3D printing created structures layer by layer, and insufficient resolution during that process was the main cause of low efficiency.
The nanoscale 3D printing technology obtained from the Sci-Tech Library used ultrashort extreme ultraviolet light for curing, producing nanoscale products.
However, after researching so many things, lasers had become one of Chen Mo's strongest areas. His laser research for Holographic Technology had long since given him a thorough grasp of laser technology, along with a great deal of relevant technical expertise.
For the nanoscale 3D printing technology, given Chen Mo's current technical reserves, the main issues were resolution, new materials, ultraviolet ink, or UV ink, and the degree of curing.
Among the technologies he had acquired was a new UV ink formula called Electron-based Ink. Under bombardment by a high-energy electron beam, it broke the double bonds in monomers or polymer materials, producing free radicals that then polymerized. Its principle was similar to EB Ink.
The two had different formulas and different effects. According to the information Chen Mo had obtained, Electron-based Ink had a curing rate close to 100%, even higher than EB Ink. Moreover, the binders suitable for Electron-based Ink were not limited to acrylic resins and reactive monomers. Its range was far broader than EB Ink's, making it suitable for most materials.
The design requirements for the 3D printer itself were also different. Such ultra-precision equipment had extremely demanding environmental requirements. Once Chen Mo had determined the technical direction for the 3D printer, he began designing it, hoping to develop this Nano 3D Printer as soon as possible.
This was one of the key technologies for industrial upgrading. With this ultra-precision printer, Chen Mo would